IC Semiconductor Crystal Growth Furnace

Semiconductor Products

The furnace can melt the polysilicon materials in an inert atmosphere and then grow high-quality semiconductor monocrystal silicon ingot that meets the requirements of IC manufacturing through CZ method automatically.

Hot zone

up to 42'
Ingot

up to 650mm
HMF

5000gs
Diameter control capability

≤±0.1mm

Large size, high precision and intelligence

AI-based intelligent crystal growth system & Allow up to 42' hot zone & Customizable magnetic field

AI Smart Manufacturing

Leveraging the AI-based intelligent manufacturing system, it is capable of high precision melting inspection, intelligent structure loss detection, and fully automated adjustment and control.
Large size

Can customize ultra-large magnetic field, up to 5000Gs HMF.
Quality assurance

The furnace is built using 304/316 stainless steel columns. Flow rate monitoring at all water lines is equipped to ensure high-quality performance and operation of the equipment.
High precision control

Leverage high-precision control system to control the ingot diameter difference to be no more than ±0.1mm

up to 42'

up to 650mm

5000gs

≤±0.1mm