IC Semiconductor Crystal Growth Furnace

Semiconductor Products

The furnace can melt the polysilicon materials in an inert atmosphere and then grow high-quality semiconductor monocrystal silicon ingot that meets the requirements of IC manufacturing through CZ method automatically.

Hot zone

up to 42'
Ingot

up to 650mm
HMF

5000gs
Diameter control capability

≤±0.1mm

Large size, high precision and intelligence

AI-based intelligent crystal growth system & Allow up to 42' hot zone & Customizable magnetic field

High precision control

Leveraging the AI-based intelligent manufacturing system, it is capable of high precision melting inspection, intelligent structure loss detection, rapid diverging detection, efficient structure loss detection during crown growth, precise bulge detection during neck growth, and fully automated adjustment and control.
Large size

Can customize ultra-large magnetic field, up to 5000Gs HMF.
Quality assurance

The furnace is built using 304/316 stainless steel columns, with the inner wall made of electro-polished 316L stainless steel. Flow rate monitoring at all water lines is equipped to ensure high-quality performance and operation of the equipment.

up to 42'

up to 650mm

5000gs

≤±0.1mm